Resolution Enhancement Techniques in optical lithography for IC Fabrication A T
Hebatallah Mohamed AbdelGwad Sharaf;
Abstract
A double patterning-aware (DP-aware) placement technique for standard
cells is studied in this thesis as a part of a general framework for placement
and routing for DP. DP is needed to continue scaling the circuit features
down and to keep increasing t
cells is studied in this thesis as a part of a general framework for placement
and routing for DP. DP is needed to continue scaling the circuit features
down and to keep increasing t
Other data
| Title | Resolution Enhancement Techniques in optical lithography for IC Fabrication A T | Other Titles | طرق تحسين النحت الضوئي في تصنيع الدوائر المتكامله | Authors | Hebatallah Mohamed AbdelGwad Sharaf | Keywords | Resolution Enhancement Techniques in optical lithography for IC Fabrication A T | Issue Date | 2012 | Description | A double patterning-aware (DP-aware) placement technique for standard cells is studied in this thesis as a part of a general framework for placement and routing for DP. DP is needed to continue scaling the circuit features down and to keep increasing t |
Attached Files
| File | Size | Format | |
|---|---|---|---|
| 116644Resolution Enhancement Techniques in Optical Lithography for IC Fabrication.pdf | 218.2 kB | Adobe PDF | View/Open |
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