EFFECT OF ANNEALING ON ENHANCING OPTICAL ABSORBANCE AND EMITTANCE PROPERTIES OF MAGNETRON-SPUTTERED TIN THIN FILMS FOR SOLAR THERMAL ABSORBER APPLICATIONS
Hanan Abd El-kader Abd El-Fattah Yousef;
Abstract
Summary:
The first part of this work covers the deposition parameters pf RF PVD
sputtering technique and their effect of thin film properties. Second part covers a
comparison between TiNxOy and TiN in as-deposited state and annealed state at 400 in
air and in vacuum. In Third part TiN thin films are deposited at different times and
flowrates of N2 gas then annealed at 800 in air and at 400 in air and in vacuum. Optical
properties and microstructure of deposited TiN before and after annealing are studied.
The change in optical properties after annealing are correlated to change in
microstructure and structure of thin films. The optical properties of all thin films before
and after annealing are characterized by spectrophotometer, and Fourier transform
infrared spectroscopy (FTIR). The morphology and structure are studied by scanning
electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction (XRD),
and Raman spectroscopy. It was found that the optical absorbance of sputtered TiN thin
films is changed after annealing at 800C and increased to 94% with a stable profile in
ultraviolet (UV), visible range and near infrared (IR) ranges.
The first part of this work covers the deposition parameters pf RF PVD
sputtering technique and their effect of thin film properties. Second part covers a
comparison between TiNxOy and TiN in as-deposited state and annealed state at 400 in
air and in vacuum. In Third part TiN thin films are deposited at different times and
flowrates of N2 gas then annealed at 800 in air and at 400 in air and in vacuum. Optical
properties and microstructure of deposited TiN before and after annealing are studied.
The change in optical properties after annealing are correlated to change in
microstructure and structure of thin films. The optical properties of all thin films before
and after annealing are characterized by spectrophotometer, and Fourier transform
infrared spectroscopy (FTIR). The morphology and structure are studied by scanning
electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction (XRD),
and Raman spectroscopy. It was found that the optical absorbance of sputtered TiN thin
films is changed after annealing at 800C and increased to 94% with a stable profile in
ultraviolet (UV), visible range and near infrared (IR) ranges.
Other data
| Title | EFFECT OF ANNEALING ON ENHANCING OPTICAL ABSORBANCE AND EMITTANCE PROPERTIES OF MAGNETRON-SPUTTERED TIN THIN FILMS FOR SOLAR THERMAL ABSORBER APPLICATIONS | Other Titles | تحسين الخواص الضوئية لطبقات التيتانيوم نيتريد بطريقة الماجنترون لتطبيقات الطاقة الشمسية الحرارية. | Authors | Hanan Abd El-kader Abd El-Fattah Yousef | Issue Date | 2019 |
Recommend this item
Similar Items from Core Recommender Database
Items in Ain Shams Scholar are protected by copyright, with all rights reserved, unless otherwise indicated.