ION BEAM ANALYSIS AND ITS APPLICATIONS

Abstract

The aim of this work is the analysis of the ion beam which is extracted from two types of electrostatic confined discharge ion sources, the cold cathode plane electrodes ion source and the hemispherical electrode confined discharge ion source. Experimental results are carried out using these ion sources. ion beam applications are also achieved such as ·sputtering of the cathode and ion etching on the Faraday cup using different gases. The experimental measurements are taken for a fixed geometry of the two types of these ion sources at different gas pressures. The discharge voltage, discharge current and output ion beam current for different gases are measured. It has been found that with the increase of the discharge voltage of the anode electrode, both the discharge current and output ion beam current increase. Also measurements are taken by applying a negative voltage to the focusing electrode of the hemispherical electrode confined discharge ion source to study its effect on the output ion beam current at different discharge powers for pressures equal to P=4.4x1o-3 mmHg. and P=5.8x1o-3 mmHg using nitrogen and argon gases respectively. It is found that the relations between the focusing voltage and output ion beam current are linear for focusing voltage greater than about 500 volt.