Improvement of Dielectric Properties and Photoconductivity of Laser Deposited Ferrite Thin Film and Bulk of Cu1+xMxFe2-2xO4; M = (Ge, Li, and Ti); to be used as Optical and Pressure Detector

ALI HASSAN ALI AHMED MAGRABI A. H. Magrabi;

Abstract


The samples under investigation of the general formula Cu1+xMxFe2-2xO4,
M=Ti, Ge, and Li, 0.0  x  0.8 were prepared using the standard ceramic technique. Thin films of different contents by PLD technique were also carried out. FTIR and X – ray diffrac


Other data

Title Improvement of Dielectric Properties and Photoconductivity of Laser Deposited Ferrite Thin Film and Bulk of Cu1+xMxFe2-2xO4; M = (Ge, Li, and Ti); to be used as Optical and Pressure Detector
Other Titles تحسين الخواص الكهربية و التوصيلية الضوئية لشريحة من الفريت Cu1+xMxFe2-2xO4; M = (Ge, Li, and Ti), المحضرة بواسطة الترسيب بالليزر بحيث يمكن استخدامه كمجس ضوئى و ضغطى
Authors ALI HASSAN ALI AHMED MAGRABI A. H. Magrabi
Keywords Improvement of Dielectric Properties and Photoconductivity of Laser Deposited Ferrite Thin Film and Bulk of Cu1+xMxFe2-2xO4; M = (Ge, Li, and Ti); to be used as Optical and Pressure Detector
Issue Date 2008
Description 
The samples under investigation of the general formula Cu1+xMxFe2-2xO4,
M=Ti, Ge, and Li, 0.0  x  0.8 were prepared using the standard ceramic technique. Thin films of different contents by PLD technique were also carried out. FTIR and X – ray diffrac

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