Investigation and predictive modeling of the optical behavior of chalcogenide thin film using different artificial neural network technique

Ibrahem Mohamed, Hanem; H. E. Atyia; R. A. Mohamed;

Abstract


The Te72Ge24As4 samples were recently created in our laboratory in bulk form
using the traditional melt-quench method. For its optical characterization. The
studied thin film samples have been created using physical vapor deposition. By
selecting the 400 nm to 2500 nm spectral range of wavelength, the spectral of the
experimental transmission T(λ) and reflectance R(λ) for the studied film samples
have been employed to examine optical characteristics. First, we have determined
the extinction coefficient ( k ) and refraction index ( n ) indices and their spectral
distribution of them. Using Tauc’s theory, we then computed the optical band
gap Eopt . Urbach energy Er is determined from the linear dependence of photon
energy on the absorption coefficient which was taken as an indicator to identify
the disorder degree in the films. The additional variables, like the dissipation and
quality factors, the dielectric constant in complex form, optical, thermal, and elec
trical conductivity, and volume/surface energy were measured. A comprehensive
analysis and predictive modeling using various artificial neural networks (ANNs)
techniques were applied to examine the optical behavior of the film samples
studied. Materials made of chalcogenide are well-known for having special opti
cal properties, making them appropriate for applications in photonics and opto
electronics. We employed multiple architectures, including Feedforward Neural
Networks (FNN) and Recurrent Neural Networks (RNN), to model the extinc
tion coefficient ( k ) and the refractive index ( n ) of these films using experimental
data


Other data

Title Investigation and predictive modeling of the optical behavior of chalcogenide thin film using different artificial neural network technique
Authors Ibrahem Mohamed, Hanem ; H. E. Atyia; R. A. Mohamed
Issue Date 3-Jan-2025
Publisher Springer
Journal J Mater Sci : Mater Electron 
Volume 36
Start page 174
DOI https://doi.org/10.1007/s10854-025-14220-4

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